Published July 15, 2006 | Version v1
Journal article

Characteristics of non-annealed λ = 1.35 μm closely lattice-matched GaInNAs/GaAs p-i-n photodetector structures grown by solid-source molecular beam epitaxy

  • 1. Nanyang Technological University, School of Electrical and Electronic Engineering, Block S1, Nanyang Avenue, Singapore 639798 (Singapore)

Description

The electrical and optical characteristics of planar non-annealed GaInNAs/GaAs p-i-n photodetector structures with 0.5 μm thick GaInNAs i-layer with nitrogen composition higher than 3% and detection wavelength up to 1.35 μm are reported. Soft-breakdown behavior in the reverse biased characteristic was observed under non-illuminated condition. Analysis of the reverse biased current dependence on detector diameter under non-illuminated condition shows a more significant contribution from the bulk generation current compared to surface recombination current. Under forward bias, the ideality factor value of 1.35 is found to be temperature independent. This suggests that the recombination current in the depletion region contributes significantly to the forward biased current besides the diffusion current. Low-temperature (4 K) photoluminescence (PL) from the GaInNAs layer shows an emission peak at λ = 1.29 μm. From curve fitting of the photoresponsivity spectrum, the room-temperature bandgap of E g,RT = 0.92 eV (or λ = 1.35 μm) is deduced. The room-temperature photoresponsivity spectrum shows a broad wavelength detection range of up to λ = 1.4 μm

Additional details

Identifiers

DOI
10.1016/j.mseb.2006.03.021;
PII
S0921-5107(06)00193-0;

Publishing Information

Journal Title
Materials Science and Engineering. B, Solid-State Materials for Advanced Technology
Journal Volume
131
Journal Issue
1-3
Journal Page Range
p. 40-44
ISSN
0921-5107
CODEN
MSBTEK

INIS

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.