Atomic structure of the ultrathin alumina on NiAl(110) and its antiphase domain boundaries as seen by frequency modulation dynamic force microscopy
Creators
- 1. Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-14195 Berlin (Germany)
Description
Atomically resolved frequency modulation dynamic force microscopy (FM-DFM) images of the ultrathin alumina film on NiAl(110) are presented. Images show in detail the surface unit cell, both types of antiphase domain boundaries (translation-related domain boundaries) and lateral displacements within these types of boundaries. Due to the loss of translational symmetry at the boundary, structures of even increased complexity are revealed. Lateral models for these local arrangements have been created on the basis of adjusted unit cell structures. FM-DFM produces on this surface a contrast of extraordinarily high surface sensitivity. It matches the topmost oxygen layer even with respect to topographic height, which adds the third dimension to the analysis. With this the antiphase domain boundaries are shown to be shallow depressions. Furthermore, new symmetry aspects have been found in the topography of these boundaries. The local structure of the film surface shows evidence of substrate influence in its topography and the domain boundary network shows indications that its growth behaviour is affected by this interaction in its very details beyond sheer appearance. Presented results can be linked to the relation between growth and structure of an emerging class of structurally related ultrathin alumina films.
Availability note (English)
Available from http://dx.doi.org/10.1088/1367-2630/11/9/093009Additional details
Identifiers
Publishing Information
- Journal Title
- New Journal of Physics
- Journal Volume
- 11
- Journal Issue
- 9
- Journal Page Range
- [16 p.]
- ISSN
- 1367-2630
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41054352
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM OXIDES; CRYSTAL GROWTH; FREQUENCY MODULATION; LAYERS; MICROSCOPY; OXYGEN; SENSITIVITY; SUBSTRATES; SYMMETRY; THIN FILMS; TOPOGRAPHY
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; ELEMENTS; FILMS; MODULATION; NONMETALS; OXIDES; OXYGEN COMPOUNDS