Published June 1986 | Version v1
Journal article Metadata-only

Mobile ions in oxygen plasma treated thermal Si02

Creators

  • 1. Bylgarska Akademiya na Naukite, Sofia. Inst. po Fizika na Tvyrdoto Tyalo

Description

The effect of oxygen plasma exposure on the motion of mobile ions in Si02-Si structures has been investigated. The ion transport was found to be limited by ion traps at the outer surface. A plasma-induced mobilization effect was observed only at 3000C substrate temperature during plasma exposure. At lower temperatures some interrelation of Na and H ions is suggested based on the behaviour of the different charge centres. (author)

Additional details

Publishing Information

Journal Title
Radiat. Eff.
Journal Volume
88
Journal Issue
3-4
Series
Radiat. Eff.
Journal Page Range
299-303
ISSN
0033-7579
CODEN
RAEFB

INIS

Country of Publication
United Kingdom
Country of Input or Organization
United Kingdom
INIS RN
17079789
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ELECTRIC POTENTIAL; FILMS; HYDROGEN IONS; ION MOBILITY; MEDIUM TEMPERATURE; OXYGEN; PLASMA; SILICON OXIDES; SODIUM IONS; TEMPERATURE DEPENDENCE; TRAPPING
Descriptors DEC
ATOMIC IONS; CHALCOGENIDES; CHARGED PARTICLES; ELEMENTS; IONS; MOBILITY; NONMETALS; OXIDES; OXYGEN COMPOUNDS; PARTICLE MOBILITY; SILICON COMPOUNDS