Formation processes of radiation defects in silicon at high temperature irradiation
- 1. Institute of Nuclear Physics, Tashkent (Uzbekistan)
Description
Full text: This work devoted to research on influence of high-temperature nuclear irradiation in the range of 100† 600oC on the electrophysical and recombination parameters and characteristics of the doped silicon and structures based on it. For studies of defect states, stimulated by nuclear irradiation and temperature, and revealing optimal regimes and conditions for thermo radiation modification and stabilization of parameters of the doped silicon and silicon structures the special electrical-heating setup with sells for samples to be processed by radiation and thermal fields was fabricated. It was studied influence of irradiation temperature on RD generation process in diodes based on n-Si with initial resistivity of 0.3 † 40 Ω· cm. The high-temperature (350 † 450oC) electron irradiation with energy of 4 MeV and fluences of 1015 † 1016 cm-2 and 60Co γ -ray irradiation with fluences of 1017† 1018 cm-2, unlike low-temperature ( ≤ 200oC) irradiation regime, leads mainly to thermally stable defects centers of complex and acceptor nature: Ec - 0.13 eV, related with the formation of (V-O3) complex, Ec - 0.20 eV, related with the complex of substitutional carbon with interstitial oxygen (Cs-Oi-Cs) and Ec - 0.35 eV, related with a complex of carbon, oxygen and vacancy. Theoretical analysis of recombination processes in silicon with defect centers was curried out by Shockly-Readley theory and it was shown that the dominant recombination center is Ec-0.35 eV, which enables one to regulate in a wide range recovery time of diodes. The measurements of current and time characteristics of silicon diffusion diodes revealed that the high-temperature radiation treatment of p-n-structures improves values of recovery time of reverse resistance and direct voltage with simultaneous enhancing stability of characteristics of diodes against temperature as compared to low-temperature (<200oC) radiation treatment. This work was supported by the STCU grant Uzb-32(J)R
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Additional details
Publishing Information
- Publisher
- Oezbekiston Respublikasi Fanlar Akademiyasi Yadro Fisikasi Instituti
- Imprint Place
- Tashkent (Uzbekistan)
- Imprint Title
- Abstracts of the third Eurasian conference on nuclear science and its application
- Imprint Pagination
- 402 p.
- Journal Page Range
- p. 281
- Report number
- INIS-UZ--100
Conference
- Title
- 3. Eurasian conference on nuclear science and its application (EC-2004)
- Dates
- 5-8 Oct 2004
- Place
- Tashkent (Uzbekistan)
INIS
- Country of Publication
- Uzbekistan
- Country of Input or Organization
- Uzbekistan
- INIS RN
- 36115870
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CARBON; COBALT 60; DEFECTS; DIFFUSION; DOPED MATERIALS; ELECTRIC POTENTIAL; ELECTRONS; EV RANGE; GAMMA RADIATION; HEATING; IRRADIATION; MEV RANGE; MODIFICATIONS; OXYGEN; RECOMBINATION; SILICON; STABILIZATION; TEMPERATURE RANGE 0065-0273 K; TEMPERATURE RANGE 0400-1000 K; VACANCIES
- Descriptors DEC
- BETA DECAY RADIOISOTOPES; BETA-MINUS DECAY RADIOISOTOPES; COBALT ISOTOPES; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELECTROMAGNETIC RADIATION; ELEMENTARY PARTICLES; ELEMENTS; ENERGY RANGE; FERMIONS; INTERMEDIATE MASS NUCLEI; INTERNAL CONVERSION RADIOISOTOPES; IONIZING RADIATIONS; ISOMERIC TRANSITION ISOTOPES; ISOTOPES; LEPTONS; MATERIALS; MINUTES LIVING RADIOISOTOPES; NONMETALS; NUCLEI; ODD-ODD NUCLEI; POINT DEFECTS; RADIATIONS; RADIOISOTOPES; SEMIMETALS; TEMPERATURE RANGE; YEARS LIVING RADIOISOTOPES