Kinetic analysis of the initiated chemical vapor deposition of poly(vinylpyrrolidone) and poly(4-vinylpyridine)

Initiated chemical vapor deposition (iCVD) is used to deposit poly(vinylpyrrolidone) (PVP) and poly(4-vinylpyridine) (P4VP). Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy and gel permeation chromatography were used to confirm the deposition of the polymers. Reactor conditions, including gas pressure and substrate temperature, were varied to determine the effect on the deposition rate of the polymer. The rate of reaction was found to increase with increasing pressure and decrease with increasing substrate temperature. Understanding the kinetics of the reaction provides a basis for applications of PVP and P4VP thin films in dye sensitized solar cells and other alternative energy applications. - Highlights: • iCVD deposition of poly(vinylpyrrolidone) and poly(4-vinylpyridine) • Polymer deposition rate increases with increasing reactor pressure. • Polymer deposition rate decreases with increasing substrate temperature. • Deposition rate is limited by the rate of adsorption of monomer on the substrate. • Fractional monomer saturation is key to controlling polymerization kinetics.