Published 2001 | Version v1
Book Metadata-only

Plasma CVD and characterization of TiN-AlN films from mixed alkoxide solutions with stabilizing agent

Creators

  • 1. Hokkaido Univ., Graduate School of Engineering, Sapporo (Japan)

Description

The TiN-AlN composite films were prepared from mixed alkoxide solutions of titanium tetraetoxide and aluminum tributoxide containing a stabilizing tri-ethanol-amine, using a liquid injection method, by r.f. thermal plasma CVD. The films were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM), X-ray photoelectron spectroscopy (XPS), and the measurements of electrical resistivity and micro-hardness. The results were compared with those for the films prepared without a stabilizing agent. (authors)

Part of:
Plasma chemistry

Additional details

Publishing Information

Publisher
First Edition
Imprint Place
Orleans (France)
Imprint Title
Plasma chemistry
Imprint Pagination
(v.1-7) 3156 p.
Journal Page Range
p. 229-232

Conference

Title
15. international symposium on plasma chemistry (ISPC15)
Dates
9-13 Jul 2001
Place
Orleans (France)

INIS

Country of Publication
France
Country of Input or Organization
France
INIS RN
35061181
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ALKOXIDES; ALUMINIUM NITRIDES; CHEMICAL PREPARATION; CHEMICAL SHIFT; CHEMICAL VAPOR DEPOSITION; COATINGS; COMPOSITE MATERIALS; MICROHARDNESS; OXIDATION; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TITANIUM NITRIDES; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY
Descriptors DEC
ALUMINIUM COMPOUNDS; CHEMICAL COATING; CHEMICAL REACTIONS; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; FILMS; HARDNESS; MATERIALS; MECHANICAL PROPERTIES; MICROSCOPY; NITRIDES; NITROGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; PNICTIDES; SCATTERING; SPECTROSCOPY; SURFACE COATING; SYNTHESIS; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS

Optional Information

Notes
8 refs.