Published September 26, 1974
| Version v1
Patent
Open
Novel electron beam recording media
Creators
Description
Electron beam recording media comprise a film of an olefin-SO2 copolymer on a support. Certain of these copolymers give direct print-out relief patterns after exposure to electron beams. The chemical composition and preparation of these layered films is described
Availability note (English)
MF available from INIS under the Report Number.Files
7234069.pdf
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Additional details
Additional titles
- Original title (Dutch)
- Registratiemedium voor elektronenstralen
Publishing Information
- Imprint Pagination
- 8 p.
- IPC:
- Int. Cl. C08g75/22.
- IPC
- Int. Cl. C08g75/22.
- Patent number
- NL patent document 7412715/A/
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 7234069
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- ALKENES; CARRIERS; CHEMICAL PREPARATION; COPOLYMERIZATION; ELECTRIC CONDUCTIVITY; ELECTRON BEAMS; ELECTRON DETECTION; FILMS; LAYERS; ORGANIC POLYMERS; PHYSICAL RADIATION EFFECTS; RECORDING SYSTEMS; SENSITIVITY; SULFUR OXIDES
- Descriptors DEC
- BEAMS; CHALCOGENIDES; CHARGED PARTICLE DETECTION; CHEMICAL REACTIONS; ELECTRICAL PROPERTIES; HYDROCARBONS; LEPTON BEAMS; ORGANIC COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PARTICLE BEAMS; PHYSICAL PROPERTIES; POLYMERIZATION; POLYMERS; RADIATION DETECTION; RADIATION EFFECTS; SULFUR COMPOUNDS; SYNTHESIS
Optional Information
- Notes
- Priority 27 Sep 1973, USA.