Microstructure and electrical properties of iron oxide thin films deposited by spray pyrolysis
Creators
Description
Microstructure and electrical properties of iron oxide Fe2O3 thin films prepared by spray pyrolysis method have been experimentally characterized. The effect of substrate temperature as well as deposition time on the structural features (crystallite size and microstrain) and electric resistivity of these films has been investigated. X-ray diffraction (XRD) and scanning electron microscope (SEM) characterized the structure study. The results of X-ray diffraction showed that with increasing substrate temperature bias the film structure changed from amorphous to crystalline at the same deposition time. At a substrate temperature of 350 deg. C and low deposition time, α-Fe2O3 appears almost in amorphous form. With rising the substrate temperature and deposition time, the crystallinity was improved. At Tsub>350 deg. C, a well-crystallized rhombohedral phase of α-Fe2O3 was obtained. Single order Voigt profile method has been used to determine the microstructure parameters. The measured value of the crystallite size and microstrain at different substrate temperatures and different deposition times were studied. The dark resistivity measurements at room temperature showed values of 2.122x105 Ω cm for amorphous iron oxide with three orders of magnitude lower than crystalline films
Additional details
Identifiers
- DOI
- 10.1016/S0169-4332(03)00951-6;
- arXiv
- arXiv:0808.1402v5;
- PII
- S0169433203009516;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 221
- Journal Issue
- 1-4
- Journal Page Range
- p. 319-329
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38089997
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- DEPOSITION; ELECTRIC CONDUCTIVITY; FERRITES; IRON OXIDES; MICROSTRUCTURE; PYROLYSIS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL REACTIONS; COHERENT SCATTERING; DECOMPOSITION; DIFFRACTION; ELECTRICAL PROPERTIES; ELECTRON MICROSCOPY; FERRIMAGNETIC MATERIALS; FILMS; IRON COMPOUNDS; MAGNETIC MATERIALS; MATERIALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SCATTERING; TEMPERATURE RANGE; THERMOCHEMICAL PROCESSES; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.