Ferromagnetism in post-annealed sputtered Cr-doped In2O3 thin films
- 1. Department of Electrical and Computer Engineering, Center for Electromagnetic Materials and Optical Systems, University of Massachusetts, Lowell, MA (United States)
- 2. Department of Physics, University of Massachusetts, Lowell, MA (United States)
Description
In the present work, we have studied the effect of a post-annealing process on the magnetic properties of thin films of Cr-doped indium oxide, In2-xCrxO3-δ. Samples with low stoichiometric oxygen deficiency, δ, which is required for ferromagnetic behavior, were fabricated using a DC/RF magnetron sputtering method. The post-annealing process described in this paper allows control of the oxygen deficiency. This method has led to samples which show clear ferromagnetic behavior at both low temperatures and at room temperature with saturation magnetic moments up to ∝1.5 μB/Cr-atoms. The measured high Curie temperature, TC ∝ 740 K, justifies the indirect electron-mediated ferromagnetic coupling of the spins of Cr ions. The ferromagnetic coupling was found to be mostly a bulk effect, which is not affected by the surface of the film. (copyright 2013 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)
Availability note (English)
Available from: http://dx.doi.org/10.1002/pssa.201228780Additional details
Identifiers
Publishing Information
- Journal Title
- Physica Status Solidi. A, Applications and Materials Science
- Journal Volume
- 210
- Journal Issue
- 12
- Journal Page Range
- p. 2644-2649
- ISSN
- 1862-6300
- CODEN
- PSSABA
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 45021813
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; CHROMIUM ADDITIONS; COERCIVE FORCE; CURIE POINT; DOPED MATERIALS; FERROMAGNETISM; INDIUM OXIDES; MAGNETIC MOMENTS; MAGNETIC PROPERTIES; MAGNETIZATION; PHYSICAL VAPOR DEPOSITION; SPUTTERING; STOICHIOMETRY; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0000-0013 K; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; X-RAY DIFFRACTION; X-RAY SPECTROSCOPY
- Descriptors DEC
- ALLOYS; CHALCOGENIDES; CHROMIUM ALLOYS; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; FILMS; HEAT TREATMENTS; INDIUM COMPOUNDS; MAGNETISM; MATERIALS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SCATTERING; SPECTROSCOPY; SURFACE COATING; TEMPERATURE RANGE; THERMODYNAMIC PROPERTIES; TRANSITION ELEMENT ALLOYS; TRANSITION TEMPERATURE