Published 1989
| Version v1
Journal article
Broad-beam ion source technology and applications
Creators
- 1. Commonwealth Scientific Corp., Alexandria, VA (USA)
- 2. Front Range Research, Fort Collins, CO (USA)
Description
The technology of broad-beam ion sources, both gridded and gridless, is briefly reviewed. The thin-film applications of these sources are also briefly reviewed, with emphasis on those at less than 2000 eV. Conventional etching and deposition applications are included, as well as more recent property-modification applications. (author)
Additional details
Publishing Information
- Journal Title
- Vacuum
- Journal Volume
- 39
- Journal Issue
- 11-12
- Series
- Vacuum.
- Journal Page Range
- 1175-1180
- ISSN
- 0042-207X
- CODEN
- VACUA
Conference
- Title
- 5. international conference.
- Acronym
- Low energy ion beams - 5
- Dates
- 3-6 Apr 1989.
- Place
- Guildford (UK).
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 21033048
- Subject category
- S74: ATOMIC AND MOLECULAR PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAM OPTICS; DEPOSITION; ENERGY DEPENDENCE; ETCHING; ION SOURCES; KEV RANGE 01-10; REVIEWS; THIN FILMS; USES
- Descriptors DEC
- DOCUMENT TYPES; ENERGY RANGE; FILMS; KEV RANGE