All p-i-n hydrogenated amorphous silicon oxide thin film solar cells for semi-transparent solar cells
- 1. Surface Technology Division, Korea Institute of Materials Science, Changwon 641-831 (Korea, Republic of)
- 2. School of Energy Systems Engineering, Chung-Ang University, Seoul 06974 (Korea, Republic of)
Description
Highlights: •All p-i-n layer amorphous silicon oxide solar cells were made. •CO2/SiH4 ratio varied from 0 to 0.6 to find an effect of oxygen addition in absorber. •An Efficiency of semitransparent solar cell increased at CO2/SiH4 ratio of 0.2. •Transmission of solar cells was also improved with the oxygen addition. -- Abstract: We focused on fabricating all p-i-n layer hydrogenated amorphous silicon oxide (a-SiOx:H) thin film solar cells in order to improve their transmittance in visible ranges of 500–800 nm for application in building integrated photovoltaics system. We varied CO2/SiH4 (R) gas flow ratio from 0 to 0.6 for i-layer to investigate an effect of oxygen addition. When the R ratio increased, the transmittance of devices improved due to the enhancement in optical bandgap of the absorber. However, power conversion efficiency (PCE) decreased owing to the increase in defects and recombination rate which might be ascribed to back bonding of oxygen atoms with Si atoms. Unlike other R flow ratio, however, the PCE of a-SiOx:H solar cell at the R ratio of 0.2 was slightly improved by the increase in open circuit voltage as indicated by the wide band gap and the increase in quantum efficiency within short-wavelengths (300–500 nm). We introduced a figure of merit (FOM), multiplication of PCE and average transmittance in range of 500–800 nm, in order to assess the performance of transparent solar cells. The a-SiOx:H solar cell at the R ratio of 0.2 achieved the highest FOM, which was better than conventional amorphous silicon solar cell.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2018.07.032Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2018.07.032;
- PII
- S004060901830498X;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 662
- Journal Page Range
- p. 97-102
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 50037120
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- AMORPHOUS STATE; CARBON DIOXIDE; DEFECTS; HYDROGENATION; LAYERS; PHOTOVOLTAIC EFFECT; QUANTUM EFFICIENCY; RECOMBINATION; SILICON OXIDES; SILICON SOLAR CELLS; THIN FILMS
- Descriptors DEC
- CARBON COMPOUNDS; CARBON OXIDES; CHALCOGENIDES; CHEMICAL REACTIONS; DIRECT ENERGY CONVERTERS; EFFICIENCY; EQUIPMENT; FILMS; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRIC CELLS; PHOTOELECTRIC EFFECT; PHOTOVOLTAIC CELLS; SILICON COMPOUNDS; SOLAR CELLS; SOLAR EQUIPMENT
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.