Influence of lithium doping on the structural and electrical characteristics of ZnO thin films
- 1. Centre for Materials for Electronics Technology (C-MET), (Department of Information Technology, Scientific Society, Ministry of Communication and Information Technology, Govt. of India), Athani - PO, Thrissur, 680 581 Kerala (India)
- 2. Micro Engineering, Kyoto University, Kyoto 606-8501 (Japan)
Description
Thin films of undoped and lithium-doped Zinc oxide, (Zn1−xLix)O; x = 0, 0.05, 0.10 and 0.20 were prepared by sol–gel method using spin-coating technique on silicon substrates [(111)Pt/Ti/SiO2/Si)]. The influence of lithium doping on the structural, electrical and microstructural characteristics have been investigated by means of X-ray diffraction, leakage current, piezoelectric measurements and scanning electron microscopy. The resistivity of the ZnO film is found to increase markedly with low levels (x ≤ 0.05) of lithium doping thereby enhancing their piezoelectric applications. The transverse piezoelectric coefficient, e31⁎ has been determined for the thin films having the composition (Zn0.95Li0.05)O, to study their suitability for piezoelectric applications. - Highlights: ► Preferentially c-axis oriented (Zn1−xLix)O films were spin-coated on glass. ► (Zn1−xLix)O thin films exhibit dense columnar microstructure. ► Low levels of lithium doping, increases the electrical resistivity of ZnO thin films. ► (Zn1−xLix)O thin films show high values of transverse piezoelectric coefficient, e⁎31.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2012.04.036Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2012.04.036;
- PII
- S0040-6090(12)00493-2;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 520
- Journal Issue
- 17
- Journal Page Range
- p. 5797-5800
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43108449
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- DOPED MATERIALS; GLASS; LEAKAGE CURRENT; LITHIUM; MICROSTRUCTURE; PIEZOELECTRICITY; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON OXIDES; SOL-GEL PROCESS; SPIN-ON COATING; SUBSTRATES; THIN FILMS; X-RAY DIFFRACTION; ZINC OXIDES
- Descriptors DEC
- ALKALI METALS; CHALCOGENIDES; COHERENT SCATTERING; CURRENTS; DEPOSITION; DIFFRACTION; ELECTRIC CURRENTS; ELECTRICITY; ELECTRON MICROSCOPY; ELEMENTS; FILMS; MATERIALS; METALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; SCATTERING; SEMIMETALS; SILICON COMPOUNDS; SURFACE COATING; ZINC COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.