Fabrication and characterization of ultra-water-repellent alumina-silica composite films
- 1. EcoTopia Science Institute, Nagoya University, Furo-cho, Chikusa, Nagoya 464-8603 (Japan)
- 2. Department of Molecular Design and Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa, Nagoya 464-8603 (Japan)
- 3. Department of Materials Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)
Description
Ultra-water-repellent (UWR) films were prepared by microwave plasma-enhanced chemical vapour deposition using trimethylmethoxysilane and aluminium (III) diisopropoxide ethylacetoacetate (ADE) as raw materials. The film was mainly composed of silica and alumina and was apparently transparent. The film thickness was approximately 500 nm. The sample surface was treated with an organosilane in order to introduce hydrophobic groups. The hydrophobic modification led to a water contact angle of more than 1500, whose value corresponds to the UWR surface. The hardness of film with an optimized Al content was significantly improved compared with that without Al. The maximum hardness was 1.71 GPa. In consequence, we successfully prepared an UWR film in the silica-alumina system
Additional details
Identifiers
- DOI
- 10.1088/0022-3727/40/1/014;
- PII
- S0022-3727(07)27928-8;
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 40
- Journal Issue
- 1
- Journal Page Range
- p. 192-197
- ISSN
- 0022-3727
- CODEN
- JPAPBE
Conference
- Title
- Bio-dielectrics: theories, mechanisms and applications
- Acronym
- 2006 conference of the Institute of Physics Dielectrics Group
- Dates
- 10-12 Apr 2006
- Place
- Leicester (United Kingdom)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38083914
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ALUMINIUM; ALUMINIUM OXIDES; CHEMICAL VAPOR DEPOSITION; FABRICATION; FILMS; HARDNESS; MICROWAVE RADIATION; PLASMA; PRESSURE RANGE GIGA PA; RAW MATERIALS; SILICA; WATER
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; CHEMICAL COATING; DEPOSITION; ELECTROMAGNETIC RADIATION; ELEMENTS; HYDROGEN COMPOUNDS; MATERIALS; MECHANICAL PROPERTIES; METALS; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PRESSURE RANGE; RADIATIONS; SURFACE COATING