Published January 7, 2007 | Version v1
Journal article

Fabrication and characterization of ultra-water-repellent alumina-silica composite films

  • 1. EcoTopia Science Institute, Nagoya University, Furo-cho, Chikusa, Nagoya 464-8603 (Japan)
  • 2. Department of Molecular Design and Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa, Nagoya 464-8603 (Japan)
  • 3. Department of Materials Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)

Description

Ultra-water-repellent (UWR) films were prepared by microwave plasma-enhanced chemical vapour deposition using trimethylmethoxysilane and aluminium (III) diisopropoxide ethylacetoacetate (ADE) as raw materials. The film was mainly composed of silica and alumina and was apparently transparent. The film thickness was approximately 500 nm. The sample surface was treated with an organosilane in order to introduce hydrophobic groups. The hydrophobic modification led to a water contact angle of more than 1500, whose value corresponds to the UWR surface. The hardness of film with an optimized Al content was significantly improved compared with that without Al. The maximum hardness was 1.71 GPa. In consequence, we successfully prepared an UWR film in the silica-alumina system

Additional details

Identifiers

DOI
10.1088/0022-3727/40/1/014;
PII
S0022-3727(07)27928-8;

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
40
Journal Issue
1
Journal Page Range
p. 192-197
ISSN
0022-3727
CODEN
JPAPBE

Conference

Title
Bio-dielectrics: theories, mechanisms and applications
Acronym
2006 conference of the Institute of Physics Dielectrics Group
Dates
10-12 Apr 2006
Place
Leicester (United Kingdom)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38083914
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ALUMINIUM; ALUMINIUM OXIDES; CHEMICAL VAPOR DEPOSITION; FABRICATION; FILMS; HARDNESS; MICROWAVE RADIATION; PLASMA; PRESSURE RANGE GIGA PA; RAW MATERIALS; SILICA; WATER
Descriptors DEC
ALUMINIUM COMPOUNDS; CHALCOGENIDES; CHEMICAL COATING; DEPOSITION; ELECTROMAGNETIC RADIATION; ELEMENTS; HYDROGEN COMPOUNDS; MATERIALS; MECHANICAL PROPERTIES; METALS; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PRESSURE RANGE; RADIATIONS; SURFACE COATING