Published December 3, 2012
| Version v1
Journal article
Chemical and structural investigations of the incorporation of metal manganese into ruthenium thin films for use as copper diffusion barrier layers
- 1. School of Physical Sciences, Dublin City University, Dublin 9 (Ireland)
- 2. Department of Materials, University of Oxford, Oxford OX1 3PH (United Kingdom)
Description
The incorporation of manganese into a 3 nm ruthenium thin-film is presented as a potential mechanism to improve its performance as a copper diffusion barrier. Manganese (∼1 nm) was deposited on an atomic layer deposited Ru film, and the Mn/Ru/SiO2 structure was subsequently thermally annealed. X-ray photoelectron spectroscopy studies reveal the chemical interaction of Mn with the SiO2 substrate to form manganese-silicate (MnSiO3), implying the migration of the metal through the Ru film. Electron energy loss spectroscopy line profile measurements of the intensity of the Mn signal across the Ru film confirm the presence of Mn at the Ru/SiO2 interface.
Additional details
Identifiers
- DOI
- 10.1063/1.4769229;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 101
- Journal Issue
- 23
- Journal Page Range
- p. 231603-231603.4
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44048303
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; COPPER; DEPOSITION; DIFFUSION BARRIERS; ELECTRONS; ENERGY-LOSS SPECTROSCOPY; INTERACTIONS; INTERFACES; LAYERS; MANGANESE ADDITIONS; MANGANESE SILICATES; MIGRATION; PERFORMANCE; RUTHENIUM; SILICA; SILICON OXIDES; SUBSTRATES; THIN FILMS; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- ALLOYS; CHALCOGENIDES; ELECTRON SPECTROSCOPY; ELEMENTARY PARTICLES; ELEMENTS; FERMIONS; FILMS; HEAT TREATMENTS; LEPTONS; MANGANESE ALLOYS; MANGANESE COMPOUNDS; METALS; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; PLATINUM METALS; REFRACTORY METALS; SILICATES; SILICON COMPOUNDS; SPECTROSCOPY; TRANSITION ELEMENT ALLOYS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS
Optional Information
- Notes
- (c) 2012 American Institute of Physics