Published September 2002 | Version v1
Journal article

Doping of GaAs layers with Si under conditions of low-temperature molecular beam epitaxy

  • 1. Siberian Physicotechnical Institute, Tomsk State University, pr. Lenina 36, Tomsk, 634050 (Russian Federation)
  • 2. Ioffe Physicotechnical Institute, Russian Academy of Sciences, Politekhnicheskaya ul. 26, St. Petersburg, 194021 (Russian Federation)
  • 3. Tomsk State University, pr. Lenina 36, Tomsk, 634050 (Russian Federation)
  • 4. Institute of Semiconductor Physics, Siberian Division, Russian Academy of Sciences, pr. Akademika Lavrent'eva 13, Novosibirsk, 630090 (Russian Federation)

Description

Using the methods of X-ray diffraction, optical absorption in the near-infrared range, and the Hall effect, the influence of growth conditions on the structure and properties of Si-doped GaAs layers grown by low-temperature molecular-beam epitaxy was investigated. The relation between the incorporation of excess As and electrical properties of the layers is analyzed

Additional details

Identifiers

Publishing Information

Journal Title
Semiconductors
Journal Volume
36
Journal Issue
9
Journal Page Range
p. 953-957
ISSN
1063-7826
CODEN
SMICES

Optional Information

Notes
Translated from Fizika i Tekhnika Poluprovodnikov, ISSN 0015-3222, 36, 1025-1030 (No. 9, 2002); (c) 2002 MAIK ''Nauka / Interperiodica''.