Ion-induced structure modification of thin molybdenum-nickel films

Mixed films of the binary transition metal alloy system Mosub(100-x)Nisub(x) have been grown by d.c. sputtering at room temperature onto NaCl and vitreous carbon substrates. The as-sputtered films are amoprhous within the range 30 < x < 80, polycrystalline bcc for 0 < x < 15 and polycrystalline fcc for 80 < x < 100. A mixed phase bcc and amorphous transitions region exists between 15 < x < 30. The films were then bombarded with Ne+ ions at either room temperature or 80 K and at energies sufficient to position maximum damage within their depth. As a result of the bombardment the films lying within the transition region of composition are rendered polycrystalline with seed crystals growing at the expense of the amorphous material. The as-deposited amorphous films remain amorphous after bombardment up to 30 dpa. (orig.)