Published February 1, 2004 | Version v1
Journal article

Bayesian group analysis of plasma-enhanced chemical vapour deposition data

Creators

  • 1. Centre for Interdisciplinary Plasma Science, Max-Planck-Institut fuer Plasmaphysik, EURATOM Association, Boltzmannstr. 2, 85 748 Garching (Germany)

Description

A ubiquitous goal in plasma-enhanced chemical vapour deposition (PECVD) is to describe the correlation between film properties and categorical and quantitative input variables. The correlations within the high-dimensional parameter space are described using a multivariate model. Bayesian group analysis is employed to assess the grouping structures of the set of data vectors. This allows to identify sub-groups or meta-groups of predefined groups of data sets, e.g. with respect to source gases. Outliers can be identified by the necessity to form a separate group. The Bayesian approach consistently allows the handling of missing data. The grouping probabilities were compared with classical approaches such as likelihood ratio tests, the Akaike information criterion and a Bayesian variant called Bayesian information criterion. The method was applied to PECVD data of rare-earth oxide film deposition and hydrocarbon film deposition to study the evidence of grouping structures attributed to categorical quantities such as rare-earth components or source gases and quantitative variates such as bias voltage

Availability note (English)

Available online at http://stacks.iop.org/1367-2630/6/25/njp4_1_025.pdf or at the Web site for the journal New Journal of Physics (ISSN 1367-2630) http://www.iop.org/

Additional details

Publishing Information

Journal Title
New Journal of Physics
Journal Volume
6
Journal Issue
1
Journal Page Range
p. 25
ISSN
1367-2630