Effect of Aluminum on Characterization of ZnTe/n-Si Heterojunction Photo detector

Aluminum doped zinc telluride ZnTenSi thin films of (400nm) thickness with (005 01 015 and 02) wt % were deposited on the glass substrate and nSi wafer to fabricate ZnTenSi heterojunction Photodetector by using thermal vacuum evaporation technique Structural optical electrical and photovoltaic properties are investigated for the samples XRD analysis shows that all the deposited ZnTenSi films show polycrystalline structure with cubic phases and highest sharp peak corresponding to (111) planes and from AFM images shows the surface roughness increase with increase Al percentage ratio The optical absorption measurement of the films was find from transmittance ranges in the variety of wavelength (400 1000) nm and the optical energy band gap decrease from 224 eV to 186 eV dependent upon the Aluminum ratio in the films moreover our studies contain the calculation of the electrical properties of hetero junction were obtained via IV (dark and light condition) and C V measurement The photoelectric properties indicated rise illumination current of heterojunctions through increasing both of incident lighting intensity and Aluminum dopant The values of specific detectivity and quantum efficiency are calculated for all samples also the best spectral response occurs when Al doping ratio 02% The high photo sensitivity and comparatively fast response haste are attributable to in height crystal quality of the [ZnTe ] thin films. (paper)