Published December 29, 2003 | Version v1
Journal article

Photoluminescence, depth profile, and lattice instability of hexagonal InN films

  • 1. Federal University Campina Grande (UFCG), Department of Electrical Engineering, 58207 Campina Grande (Brazil)
  • 2. VIR A/S, Kuldyssen 10, DK-2630 Taastrup (Denmark)
  • 3. Technical University St. Petersburg, Politeknichaskaya 29, St. Petersburg (Russian Federation)
  • 4. Laboratorium fuer Informationstechnologie (Lfl), Universitaet Hannover, Schneiderberg 32, D-30167 Hannover (Germany)

Description

High quality InN films have been grown on (0001) sapphire substrates by metalorganic molecular beam epitaxy, characterized for crystal structure, chemical composition, and optical properties. Depth profiling indicated a high, increasing oxygen concentration profile towards the volume of the film. Photoluminescence revealed two different, coexisting features: a low energy transition around 0.8 eV, and a high energy feature, peaking near 2 eV. The former band originates from the direct transition in the near surface range. The latter, low intensity band results from the bulk region. Oxynitride formation has been accounted for a spatially varying optical band gap EG, determined to 0.61 eV for pure, defect free material. X-ray diffraction analysis supports defect mediated lattice instability, as proposed recently by a molecular dynamic lattice theory

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
83
Journal Issue
26
Journal Page Range
p. 5440-5442
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2003 American Institute of Physics.