Published September 9, 2005 | Version v1
Journal article

Practical Applications of XRR-XRF Metrology Tool

  • 1. CEA-DRT-LETI - CEA-GRE , 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France)
  • 2. STMicroelectronics, 850 rue Jean Monnet, 38926 Crolles Cedex (France)

Description

X-Ray Reflectometry (XRR) and micro-spot X-Ray Fluorescence (XRF) are well-known non-destructive methods to characterize thin films in terms of thickness, density, roughness and composition. We use a JVX 5200 XRR-XRF-combined Metrology Tool from Jordan Valley on a routine basis, which gives us valuable information to monitor and/or qualify a wide range of processes. In this work, we present characterization results obtained for both copper barrier applications and high-k (HfO2, HfO2/Al2O3 alloys and nanolaminates) studies

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
788
Journal Issue
1
Journal Page Range
p. 329-332
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
2005 international conference on characterization and metrology for ULSI technology
Dates
15-18 Mar 2005
Place
Richardson, TX (United States)

Optional Information

Notes
(c) 2005 American Institute of Physics