Published May 23, 2016
| Version v1
Journal article
Dopant-controlled single-electron pumping through a metallic island
Creators
- 1. Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig (Germany)
- 2. University Grenoble Alpes and CEA-INAC-PHELIQS, F-38000 Grenoble (France)
- 3. University Grenoble Alpes and CEA-Leti-Minatec, F-38000 Grenoble (France)
- 4. Faculty of Physics and Mathematics, University of Latvia, Zellu Street 25, LV 1002 Riga (Latvia)
Description
We investigate a hybrid metallic island/single dopant electron pump based on fully depleted silicon-on-insulator technology. Electron transfer between the central metallic island and the leads is controlled by resonant tunneling through single phosphorus dopants in the barriers. Top gates above the barriers are used to control the resonance conditions. Applying radio frequency signals to the gates, non-adiabatic quantized electron pumping is achieved. A simple deterministic model is presented and confirmed by comparing measurements with simulations.
Additional details
Identifiers
- DOI
- 10.1063/1.4951679;
- arXiv
- arXiv:1603.00250v1;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 108
- Journal Issue
- 21
- Journal Page Range
- vp.
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48035260
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- DIFFUSION BARRIERS; DOPED MATERIALS; ELECTRON TRANSFER; PHOSPHORUS; PUMPING; RADIOWAVE RADIATION; RESONANCE; SIGNALS; SILICON; SIMULATION; TUNNEL EFFECT
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; ELEMENTS; MATERIALS; NONMETALS; RADIATIONS; SEMIMETALS
Optional Information
- Notes
- (c) 2016 Author(s)