Published May 23, 2016 | Version v1
Journal article

Dopant-controlled single-electron pumping through a metallic island

  • 1. Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig (Germany)
  • 2. University Grenoble Alpes and CEA-INAC-PHELIQS, F-38000 Grenoble (France)
  • 3. University Grenoble Alpes and CEA-Leti-Minatec, F-38000 Grenoble (France)
  • 4. Faculty of Physics and Mathematics, University of Latvia, Zellu Street 25, LV 1002 Riga (Latvia)

Description

We investigate a hybrid metallic island/single dopant electron pump based on fully depleted silicon-on-insulator technology. Electron transfer between the central metallic island and the leads is controlled by resonant tunneling through single phosphorus dopants in the barriers. Top gates above the barriers are used to control the resonance conditions. Applying radio frequency signals to the gates, non-adiabatic quantized electron pumping is achieved. A simple deterministic model is presented and confirmed by comparing measurements with simulations.

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
108
Journal Issue
21
Journal Page Range
vp.
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
48035260
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
DIFFUSION BARRIERS; DOPED MATERIALS; ELECTRON TRANSFER; PHOSPHORUS; PUMPING; RADIOWAVE RADIATION; RESONANCE; SIGNALS; SILICON; SIMULATION; TUNNEL EFFECT
Descriptors DEC
ELECTROMAGNETIC RADIATION; ELEMENTS; MATERIALS; NONMETALS; RADIATIONS; SEMIMETALS

Optional Information

Notes
(c) 2016 Author(s)