Epitaxial Ca2RuO4+δ thin films grown on (001) LaAlO3 by pulsed laser deposition
Creators
- 1. National High Magnetic Field Laboratory, Tallahassee, FL 32310 (United States)
- 2. Department of Electrical and Computer Engineering, FAMU-FSU College of Engineering, FL 32310 (United States)
Description
Ca2RuO4+δ single crystal has shown intriguing physical properties that are the focus of many recent studies. In this work, epitaxial Ca2RuO4+δ thin films have been grown by pulsed laser deposition technique. The crystallinity and microstructures of the films were studied by both X-ray diffraction and transmission electron microscopy. Under carefully controlled conditions, Ca2RuO4+δ grows epitaxially on (001) LaAlO3 substrate with a in-plane relationship of <110>film <100>sub. The lattice parameters of films are consistent with a strained long phase. The growth conditions that influence the film quality, such as substrate temperature, target composition, oxygen pressure and flow rate, have been systematically studied. The thin film's magnetic and electrical transport properties differ drastically from the bulk counterpart. In contrary to the bulk, our films show overall metallic behavior with no magnetic transition in temperature range of 4-300 K. A weak metal to non-metal transition at about 200 K was observed, which could be correlated to the imperfect microstructures of the thin films
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2006.09.028;
- PII
- S0040-6090(06)01079-0;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 515
- Journal Issue
- 7-8
- Journal Page Range
- p. 3946-3951
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39022875
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINATES; CALCIUM COMPOUNDS; ENERGY BEAM DEPOSITION; EPITAXY; FLOW RATE; LANTHANUM COMPOUNDS; LASER RADIATION; LATTICE PARAMETERS; MICROSTRUCTURE; MONOCRYSTALS; OXYGEN; PHYSICAL PROPERTIES; PULSED IRRADIATION; RUTHENIUM COMPOUNDS; TEMPERATURE RANGE 0000-0013 K; TEMPERATURE RANGE 0013-0065 K; TEMPERATURE RANGE 0065-0273 K; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION
- Descriptors DEC
- ALKALINE EARTH METAL COMPOUNDS; ALUMINIUM COMPOUNDS; COHERENT SCATTERING; CRYSTAL GROWTH METHODS; CRYSTALS; DEPOSITION; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELEMENTS; FILMS; IRRADIATION; MICROSCOPY; NONMETALS; OXYGEN COMPOUNDS; RADIATIONS; RARE EARTH COMPOUNDS; REFRACTORY METAL COMPOUNDS; SCATTERING; SURFACE COATING; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.