Published February 26, 2007 | Version v1
Journal article

Epitaxial Ca2RuO4+δ thin films grown on (001) LaAlO3 by pulsed laser deposition

  • 1. National High Magnetic Field Laboratory, Tallahassee, FL 32310 (United States)
  • 2. Department of Electrical and Computer Engineering, FAMU-FSU College of Engineering, FL 32310 (United States)

Description

Ca2RuO4+δ single crystal has shown intriguing physical properties that are the focus of many recent studies. In this work, epitaxial Ca2RuO4+δ thin films have been grown by pulsed laser deposition technique. The crystallinity and microstructures of the films were studied by both X-ray diffraction and transmission electron microscopy. Under carefully controlled conditions, Ca2RuO4+δ grows epitaxially on (001) LaAlO3 substrate with a in-plane relationship of <110>film <100>sub. The lattice parameters of films are consistent with a strained long phase. The growth conditions that influence the film quality, such as substrate temperature, target composition, oxygen pressure and flow rate, have been systematically studied. The thin film's magnetic and electrical transport properties differ drastically from the bulk counterpart. In contrary to the bulk, our films show overall metallic behavior with no magnetic transition in temperature range of 4-300 K. A weak metal to non-metal transition at about 200 K was observed, which could be correlated to the imperfect microstructures of the thin films

Additional details

Identifiers

DOI
10.1016/j.tsf.2006.09.028;
PII
S0040-6090(06)01079-0;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
515
Journal Issue
7-8
Journal Page Range
p. 3946-3951
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.