Formation of diamond-like carbon film using high-power impulse magnetron sputtering
- 1. Department of Electrical and Electronic Engineering, Meijo University, 1-501, Shiogamaguchi, Tempaku-ku, Nagoya 468-8502 (Japan)
- 2. Department of Electrical and Electronic Engineering, Chiba Institute of Technology, 2-17-1 Tsudanuma, Narashino 275-0016 (Japan)
- 3. Department of Mechanical Engineering, Gifu University, 1-1 Yanagido, Gifu 501-1193 (Japan)
Description
Highlights: • Ion energy distribution function(IEDF) for carbon target in HiPIMS was clarified. • The IEDF of Ar + contained both low- and high-energy components. • The IEDF of C+ contained only high-energy components. • An increase in the applied voltage resulted in a decrease in the friction coefficient of DLC films. -- Abstract: In this study, a diamond-like carbon (DLC) films were formed using high-power impulse magnetron sputtering (HiPIMS), after which the ion energy distribution function (IEDF) for the argon ions (Ar+) and carbon ions (C+) was measured using energy-resolved mass spectrometry in order to clarify the role of the HiPIMS operating parameters and gas species on the film quality and the resulting tribological performance. We found that the IEDF for Ar+ contained both low-energy and high-energy components, whereas the IEDF for C+ contained primarily high-energy components. For DLC films formed at a substrate bias voltage of zero under the same gas-phase analysis conditions, we found that the deposition rate increased linearly as the applied voltage was increased, and that the carbon structure showed little change when analyzed by Raman spectroscopy. In addition, both the friction coefficient and the wear resistance were improved. These results indicate that both Ar+ and C+ have the potential to play important roles in determining the deposition mechanism and quality of DLC films.
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2019.01.005;
- PII
- S0040609019300057;
Publishing Information
- Journal Title
- Thin Solid Films (Print)
- Journal Volume
- 672
- Journal Page Range
- p. 104-108
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Switzerland
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 55041205
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ARGON IONS; CARBON IONS; DEPOSITION; DIAMONDS; DISTRIBUTION FUNCTIONS; ELECTRIC POTENTIAL; ENERGY SPECTRA; FRICTION FACTOR; MAGNETRONS; MASS SPECTROSCOPY; PERFORMANCE; PHASE STUDIES; PULSES; RAMAN SPECTROSCOPY; SUBSTRATES; TRIBOLOGY; WEAR RESISTANCE
- Descriptors DEC
- CARBON; CHARGED PARTICLES; DIMENSIONLESS NUMBERS; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FUNCTIONS; IONS; LASER SPECTROSCOPY; MECHANICAL PROPERTIES; MICROWAVE EQUIPMENT; MICROWAVE TUBES; MINERALS; NONMETALS; SPECTRA; SPECTROSCOPY
Optional Information
- Copyright
- Copyright (c) 2019 Elsevier B.V. All rights reserved.