Atomistic simulations and their use in investigations of nanometric changes induced by ion bombarding

Creating structures of nanometric scale with engineering accuracy is one of the technological challenges today. Traditional lithography can ba hardly used below in the range 100 nm. Current studies try preparation nanodots using the properties of self organizing systems. Recently, tests have been set to exploit the changes in surface morphiology induced by low energy ion bombardment. Ion processing is widely used in basic and applied sciences as well as in technology. For example, low energy noble gas ions are used for thinning or smoothing samples. On the surface of some metals and semiconductors characteristic periodical structures are formed, like surface waves, nanodots or nanoholes. The paper gives explanations on atomic mix and surface roughness in mass anisotropy. (TRA)