Development of ion exchange resins with ultra-low residuals for condensate polishing applications

Graver Technologies developed and commercialized an ultra-low chloride strongly basic anion resin for condensate polishing applications. Multiple lots of this new resin were installed in a nuclear plant in the United States. The ultra-low chloride resin allowed this plant to increase their amine concentration and consequently to reduce iron transport. Work is underway to develop a corresponding ultra-low sulfate strongly acidic cation resin for condensate polishing applications. The development study involves post-treatment of a number of commercially available strongly acidic cation resins under comparable, strictly controlled conditions. Sulfate leachables and total oxidizable carbon (TOC) measurements during and after the post-treatment operations serve as metrics for this project. (orig.)