Published 1979 | Version v1
Journal article

The fundamental features and characteristics of discharge and plasma ion sources

Creators

  • 1. Niels Bohr Inst., Copenhagen (Denmark)

Description

An analysis of some of the fundamental and special physical processes occurring in discharge and plasma ion sources is presented. The main purpose of the lecture is to present to the users of ion sources some key elements of information, of which not all may be generally recognised and which hopefully will be of value for a better understanding of the operational problems related to the complex behaviour of discharge and plasma ion sources. (author)

Additional details

Publishing Information

Journal Title
Radiat. Eff.
Journal Volume
44
Journal Issue
1-4
Series
Radiat. Eff.
Journal Page Range
145-156
ISSN
0033-7579

Conference

Title
2. international conference on ion implantation equipment.
Dates
28 - 31 Aug 1978.
Place
Povo-Trento, Italy.

INIS

Country of Publication
United Kingdom
Country of Input or Organization
United Kingdom
INIS RN
11544414
Subject category
S07: ISOTOPES AND RADIATION SOURCES; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ELECTRIC DISCHARGES; ION IMPLANTATION; ION SOURCES; PLASMA; SPECIFICATIONS