Published 1979
| Version v1
Journal article
The fundamental features and characteristics of discharge and plasma ion sources
Description
An analysis of some of the fundamental and special physical processes occurring in discharge and plasma ion sources is presented. The main purpose of the lecture is to present to the users of ion sources some key elements of information, of which not all may be generally recognised and which hopefully will be of value for a better understanding of the operational problems related to the complex behaviour of discharge and plasma ion sources. (author)
Additional details
Publishing Information
- Journal Title
- Radiat. Eff.
- Journal Volume
- 44
- Journal Issue
- 1-4
- Series
- Radiat. Eff.
- Journal Page Range
- 145-156
- ISSN
- 0033-7579
Conference
- Title
- 2. international conference on ion implantation equipment.
- Dates
- 28 - 31 Aug 1978.
- Place
- Povo-Trento, Italy.
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 11544414
- Subject category
- S07: ISOTOPES AND RADIATION SOURCES; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ELECTRIC DISCHARGES; ION IMPLANTATION; ION SOURCES; PLASMA; SPECIFICATIONS