Published April 15, 1987
| Version v1
Journal article
<110> channeled depth distributions and values of electronic stopping for the fourth-row transition elements (Z = 19 -- 28) in the silicon crystal
Description
We report experimentally measured depth distributions of the transitions elements of the fourth row of the periodic table channeled in the <110> direction of the Si crystal and calculate the corresponding values of electronic stopping S/sub e/. These values show the Z1-dependent nature of electronic stopping in this region of atomic number. The <110> channeled depth distributions of these transition (d shell) elements exhibit three peaks; the possible origin of the middle peak, which is not observed for the nontransition elements, is discussed
Additional details
Publishing Information
- Journal Title
- J. Appl. Phys.
- Journal Volume
- 61
- Journal Issue
- 8
- Series
- J. Appl. Phys.
- Journal Page Range
- 2734-2736
- ISSN
- 0021-8979
- CODEN
- JAPIA
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 18053712
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S73: NUCLEAR PHYSICS AND RADIATION PHYSICS;
- Resource subtype / Literary indicator
- Numerical Data
- Descriptors DEI
- CALCIUM IONS; CHARGED-PARTICLE TRANSPORT; CHROMIUM IONS; COBALT IONS; EXPERIMENTAL DATA; ION CHANNELING; ION IMPLANTATION; IRON IONS; MANGANESE IONS; NICKEL IONS; POTASSIUM IONS; SCANDIUM IONS; SILICON; STOPPING POWER; TITANIUM IONS; VANADIUM IONS
- Descriptors DEC
- ATOMIC IONS; CHANNELING; CHARGED PARTICLES; DATA; ELEMENTS; INFORMATION; IONS; NUMERICAL DATA; RADIATION TRANSPORT; SEMIMETALS