Published September 30, 2006 | Version v1
Journal article

In situ transmission electron microscopy study of the nucleation and grain growth of Ge2Sb2Te5 thin films

  • 1. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701 (Korea, Republic of)
  • 2. Semiconductor Materials and Devices Laboratory, Korea Institute of Science and Technology, Seoul 136-791 (Korea, Republic of)

Description

The nucleation and grain growth of the Ge2Sb2Te5 (GST) thin films were studied using high voltage electron microscope operated at 1250 kV. As a result, we have found that 2 nm-sized nucleus forms as a cluster which atoms are arranged regularly at the stage of nucleation prior to the formation of grains having crystal structure. The high-resolution transmission electron microscopy study and fast-Fourier transformations revealed that coexistence of face-centered-cubic (FCC) and hexagonal structure occurs, and formation of twin defect is found in the hexagonal structure during the grain growth as the annealing temperature is increased. GST grain having the hexagonal structure grow from the surface, and the growth proceeded perpendicular to the [0 0 0 1], namely the path parallel to the (0 0 0 1) plane. Consequently, grain growth to a large-scale result in a lengthened shape

Additional details

Identifiers

DOI
10.1016/j.apsusc.2005.10.026;
PII
S0169-4332(05)01501-1;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
252
Journal Issue
23
Journal Page Range
p. 8102-8106
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.