Effect of annealing on tungsten oxide thin films for acetone gas detection
- 1. Thapar University (India)
- 2. CSIR – Central Electronics Engineering Research Institute (India)
Description
The gas-sensing properties and topology of tungsten oxide thin films deposited by reactive-ion radiofrequency magnetron sputtering were investigated at room temperature. The abnormalities in sensing film behaviour were observed when acetone gas is flowed over surface. The reduction reaction of surface and oxidation reaction of acetone gas were studied. As the gas comes in contact with the surface, the molecules tend to reduce the surface, hence, decreasing the resistance. The sensing film was annealed at different temperatures, viz., 300, 400, 500, 600 and for 1 h each for the purpose of finding the optimum annealing temperature to detect acetone gas. Various characterizations, viz., XRD, AFM, FESEM, thickness measurement through surface profiler, gas-sensing characterization for recording resistance changes were performed. The optimum annealing temperature at which the sensing film gives maximum response when it comes in contact with acetone gas was computed to be . Also, operational optimum temperature for sensing film annealed at was computed to be . A grain size of 7.3 nm was computed through analysis of AFM image and a film thickness of 100 nm was calculated through surface profiler. The SEM image of the film demonstrates that the grains developed on the surface, which increase in size with increase in the annealing temperature. The XRD patterns reveal that the oxide showed up was . It was observed that the response percentage is 31% for acetone vapour concentration of 20 ppm, 19% for the concentration of 15 ppm and 15% for the concentration of 10 ppm. The response time of the sensor is 5 min and the recovery time is 4 min.
Additional details
Identifiers
Publishing Information
- Journal Title
- Bulletin of Materials Science
- Journal Volume
- 41
- Journal Issue
- 4
- Journal Page Range
- p. 1-8
- ISSN
- 0250-4707
- CODEN
- BUMSDW
INIS
- Country of Publication
- India
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 50028056
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ACETONE; ANNEALING; ATOMIC FORCE MICROSCOPY; CONCENTRATION RATIO; DETECTION; GRAIN SIZE; MAGNETRONS; OXIDATION; RADIOWAVE RADIATION; SCANNING ELECTRON MICROSCOPY; SPUTTERING; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TOPOLOGY; TUNGSTEN OXIDES; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL REACTIONS; COHERENT SCATTERING; DIFFRACTION; DIMENSIONLESS NUMBERS; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; FILMS; HEAT TREATMENTS; KETONES; MATHEMATICS; MICROSCOPY; MICROSTRUCTURE; MICROWAVE EQUIPMENT; MICROWAVE TUBES; ORGANIC COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; REFRACTORY METAL COMPOUNDS; SCATTERING; SIZE; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS; TUNGSTEN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2018 Indian Academy of Sciences