Published May 26, 2003 | Version v1
Journal article

Tuning the structural and optical properties of 1.3-μm InAs/GaAs quantum dots by a combined InAlAs and GaAs strained buffer layer

  • 1. EPSRC National Centre for III-V Technologies, Department of Electronic and Electrical Engineering, University of Sheffield, Sheffield S1 3JD (United Kingdom)

Description

A combined InAlAs and GaAs strained buffer layer was presented to tailor the structural and optical properties of 1.3-μm InAs/GaAs quantum dots. This growth technique exhibits an increment of InAs quantum-dot density from 1.6x1010 to 2.8x1010 cm-2 and an improvement of energy separation between the quantum-dot ground and first-excited states from 84 to 93 meV upon adjusting the thickness of GaAs in InAlAs-GaAs buffer layer. We also investigate the effect of an InAlAs layer surrounding InAs quantum dots on photoluminescence intensity with increasing the thickness of InAlAs layer in a 6-nm InAlAs-InGaAs composite cap layer, and no negative effect has been observed

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
82
Journal Issue
21
Journal Page Range
p. 3644-3646
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2003 American Institute of Physics.