Published March 23, 2015 | Version v1
Journal article

InP-based type-I quantum well lasers up to 2.9 μm at 230 K in pulsed mode on a metamorphic buffer

  • 1. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050 (China)

Description

This work reports on up to 2.9 μm lasing at 230 K of InP-based type-I quantum well lasers. This record long wavelength lasing is achieved by applying InP-based Sb-free structures with eight periods of strain-compensated InAs quantum wells grown on metamorphic In0.8Al0.2As template layers. The continuous-wave threshold current density is 797 A/cm2 and the idealized extrapolated threshold current density for infinite cavity length is as low as 58 A/cm2 per quantum well at 120 K. This scheme is a promising pathway for extending the wavelength range of type-I quantum well lasers on InP substrates

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
106
Journal Issue
12
Journal Page Range
p. 121102-121102.4
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
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