Published October 1977
| Version v1
Journal article
Analytical approximate equations for the resistivity and its temperature coefficient in thin polycrystalline metallic films
Creators
- 1. Nancy-1 Univ., 54 (France). Lab. d'Electronique et Physique du Solide
Description
In the usual thickness range of sputtered metallic films, analytical linearized approximate expressions of polycrystalline film resistivity and its t.c.r. are deduced from the Mayadas-Shatzkes theoretical equations. A good experimental fit is observed for Al rf sputtered metal films. (orig.)
Abstract (German)
Auf der Basis der theoretischen Gleichungen von Mayadas-Shatzkes werden im gebraeuchlichen Dickenbereich gesputterter Metallschichten linearisierte Naeherungsausdruecke fuer den Widerstand von polykristallinen Schichten und dessen Temperaturkoeffizienten abgeleitet. Man erhaelt eine gute Uebereinstimmung mit dem Experiment bei rf-gesputterten Al-Metallschichten. (orig.)Additional details
Identifiers
- DOI
- 10.1007/bf00883093;
Publishing Information
- Journal Title
- Applied Physics
- Journal Volume
- 14
- Journal Issue
- 2
- Series
- Appl. Phys.
- Journal Page Range
- 221-224
- ISSN
- 0340-3793
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 9353493
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ALUMINIUM; ELECTRIC CONDUCTIVITY; FILMS; MATHEMATICAL MODELS; POLYCRYSTALS; SPUTTERING
- Descriptors DEC
- CRYSTALS; ELECTRICAL PROPERTIES; ELEMENTS; METALS; PHYSICAL PROPERTIES
Optional Information
- Notes
- 4 tabs.; 15 refs.; Updated automatically by Metadata and Full-Text Enrichment Agent