Published July 15, 2012
| Version v1
Journal article
Preparation of ultrathin polydimethylsiloxane-coating on Cu as oxidation-protection layer
Creators
- 1. SKKU Advanced Institute of Nano Technology (SAINT), 440-746 Suwon (Korea, Republic of)
- 2. R and D Center, ChangSung Co. Ltd., Incheon (Korea, Republic of)
- 3. Department of Chemistry, Sungkyunkwan University, 440-746 Suwon (Korea, Republic of)
- 4. Department of Chemical Engineering, Sungkyunkwan University, 440-746 Suwon (Korea, Republic of)
- 5. Materials Processing Division, Korea Institute of Materials Science, Changwon 641-010 (Korea, Republic of)
Description
Very thin polydimethylsiloxane (PDMS)-layer with a mean thickness of 3-5 nm was formed on Cu particles by using thermal evaporation of PDMS at 200 °C under nitrogen atmosphere. Using X-ray photoelectron spectroscopy and FT-IR, it was shown that the dimethylsiloxane framework was sustained after evaporation of PDMS and its deposition on Cu particles. Initiation temperature for oxidation of Cu was shifted to a higher temperature by more than 50 °C in the presence of PDMS-layer, indicating that PDMS can be used as protection layer of metal particles in various applications.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2012.04.087Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2012.04.087;
- PII
- S0169-4332(12)00741-6;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 258
- Journal Issue
- 19
- Journal Page Range
- p. 7562-7566
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44030866
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- COPPER; EVAPORATION; FOURIER TRANSFORM SPECTROMETERS; INFRARED SPECTRA; LAYERS; METALS; OXIDATION; SAFETY; SURFACES; THICKNESS; THIN FILMS; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CHEMICAL REACTIONS; DIMENSIONS; ELECTRON SPECTROSCOPY; ELEMENTS; FILMS; MEASURING INSTRUMENTS; METALS; PHASE TRANSFORMATIONS; PHOTOELECTRON SPECTROSCOPY; SPECTRA; SPECTROMETERS; SPECTROSCOPY; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.