Published October 2010
| Version v1
Journal article
Multi-bias capacitance voltage characteristic of AlGaN/GaN HEMT
Creators
- 1. Key Laboratory of Microelectronics Device and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)
Description
The method of multi-bias capacitance voltage measurement is presented. The physical meaning of gate-source and gate-drain capacitances in AlGaN/GaN HEMT and the variations in them with different bias conditions are discussed. A capacitance model is proposed to reflect the behaviors of the gate-source and gate-drain capacitances, which shows a good agreement with the measured capacitances, and the power performance obtains good results compared with the measured data from the capacitance model. (semiconductor devices)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/31/10/104002Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 31
- Journal Issue
- 10
- Journal Page Range
- [4 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42071651
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM NITRIDES; CAPACITANCE; ELECTRIC POTENTIAL; ELECTRON MOBILITY; GALLIUM NITRIDES; TRANSISTORS
- Descriptors DEC
- ALUMINIUM COMPOUNDS; ELECTRICAL PROPERTIES; GALLIUM COMPOUNDS; MOBILITY; NITRIDES; NITROGEN COMPOUNDS; PARTICLE MOBILITY; PHYSICAL PROPERTIES; PNICTIDES; SEMICONDUCTOR DEVICES