Published October 2010 | Version v1
Journal article

Multi-bias capacitance voltage characteristic of AlGaN/GaN HEMT

  • 1. Key Laboratory of Microelectronics Device and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)

Description

The method of multi-bias capacitance voltage measurement is presented. The physical meaning of gate-source and gate-drain capacitances in AlGaN/GaN HEMT and the variations in them with different bias conditions are discussed. A capacitance model is proposed to reflect the behaviors of the gate-source and gate-drain capacitances, which shows a good agreement with the measured capacitances, and the power performance obtains good results compared with the measured data from the capacitance model. (semiconductor devices)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/31/10/104002

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
31
Journal Issue
10
Journal Page Range
[4 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42071651
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ALUMINIUM NITRIDES; CAPACITANCE; ELECTRIC POTENTIAL; ELECTRON MOBILITY; GALLIUM NITRIDES; TRANSISTORS
Descriptors DEC
ALUMINIUM COMPOUNDS; ELECTRICAL PROPERTIES; GALLIUM COMPOUNDS; MOBILITY; NITRIDES; NITROGEN COMPOUNDS; PARTICLE MOBILITY; PHYSICAL PROPERTIES; PNICTIDES; SEMICONDUCTOR DEVICES