Published July 1982 | Version v1
Journal article Metadata-only

Ion implantation in semiconductors and its application (review)

Creators

Description

New practical applications of ion implantation in metals, semiconductors and dielectrics are considered. Ion beams are classified by energies depending on the nature of the effect on solids. Special attention is paid to technological aspects for generalization of certain data on control of ion implantation conditions

Additional details

Additional titles

Original title (Russian)
Ионное легирование полупроводников и его применение (обзор)

Publishing Information

Journal Title
Fiz. Khim. Obrab. Mater.
Journal Issue
no.4
Series
Fiz. Khim. Obrab. Mater.
ISSN
0015-3214

INIS

Country of Publication
Russian Federation
Country of Input or Organization
USSR
INIS RN
14754388
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
CORROSION; FRICTION; GLASS; HARDENING; ION IMPLANTATION; KEV RANGE; METALS; PHYSICAL RADIATION EFFECTS; RADIATION DOSES; REVIEWS; SEMICONDUCTOR MATERIALS; SUPERCONDUCTIVITY; USES
Descriptors DEC
CHEMICAL REACTIONS; DOCUMENT TYPES; ELECTRIC CONDUCTIVITY; ELECTRICAL PROPERTIES; ELEMENTS; ENERGY RANGE; MATERIALS; PHYSICAL PROPERTIES; RADIATION EFFECTS