Published 2004 | Version v1
Miscellaneous Metadata-only

Cl2 - based ICP etching of InP

Creators

  • 1. Technical University of Lodz, Lodz (Poland)
  • 2. Ecole Centrale de Lyon, LEOM, Ecully, (France)

Description

no abstract available

Part of:
Abstracts book of 8. Electron Technology Conference ELTE 2004

Additional details

Publishing Information

Imprint Title
Abstracts book of 8. Electron Technology Conference ELTE 2004
Imprint Pagination
502 p.
Journal Page Range
p. 134-135

Conference

Title
8. Electron Technology Conference ELTE 2004
Dates
19-22 Apr 2004
Place
Stare Jablonki (Poland)

INIS

Country of Publication
Poland
Country of Input or Organization
Poland
INIS RN
37004014
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
No Abstract, Conference, Non-conventional Literature
Descriptors DEI
ARGON; ATOMIC FORCE MICROSCOPY; CHLORINE; ETCHING; INDIUM PHOSPHIDES; METHANE; MORPHOLOGY; PLASMA; ROUGHNESS; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTIES
Descriptors DEC
ALKANES; ELECTRON MICROSCOPY; ELEMENTS; FLUIDS; GASES; HALOGENS; HYDROCARBONS; INDIUM COMPOUNDS; MICROSCOPY; NONMETALS; ORGANIC COMPOUNDS; PHOSPHIDES; PHOSPHORUS COMPOUNDS; PNICTIDES; RARE GASES; SURFACE FINISHING; SURFACE PROPERTIES

Optional Information

Notes
2 figs