Published December 16, 2013 | Version v1
Journal article

The electron-phonon relaxation time in thin superconducting titanium nitride films

  • 1. Moscow Institute of Physics and Technology (State University), Dolgoprudny 141700 (Russian Federation)
  • 2. Physics Department, Moscow State Pedagogical University, Moscow 119991 (Russian Federation)
  • 3. School of Physics and Astronomy, Cardiff University, Cardiff CF24 3AA (United Kingdom)
  • 4. National Research Centre, "Kurchatov Institute," Moscow 123128 (Russian Federation)
  • 5. Kavli Institute of Nanoscience, Delft University of Technology, 2628 CJ Delft (Netherlands)
  • 6. National Research University Higher School of Economics, Moscow 101000 (Russian Federation)

Description

We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T−3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
103
Journal Issue
25
Journal Page Range
p. 252602-252602.4
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2013 AIP Publishing LLC