Published May 2010 | Version v1
Journal article Metadata-only

Total reflection X-ray photoelectron spectroscopy: A review

Creators

  • 1. Department of Materials Science and Engineering, Kyoto Univerisity, Sakyo-ku, Kyoto 606-8501 (Japan)

Description

Total reflection X-ray photoelectron spectroscopy (TRXPS) is reviewed and all the published papers on TRXPS until the end of 2009 are included. Special emphasis is on the historical development. Applications are also described for each report. The background reduction is the most important effect of total reflection, but interference effect, relation to inelastic mean free path, change of probing depth are also discussed.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.elspec.2009.12.001

Additional details

Identifiers

DOI
10.1016/j.elspec.2009.12.001;
PII
S0368-2048(09)00271-0;

Publishing Information

Journal Title
Journal of Electron Spectroscopy and Related Phenomena
Journal Volume
178-179
Journal Page Range
p. 268-272
ISSN
0368-2048
CODEN
JESRAW

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41085673
Subject category
S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; S74: ATOMIC AND MOLECULAR PHYSICS;
Descriptors DEI
INTERFERENCE; MEAN FREE PATH; REFLECTION; REVIEWS; X-RAY PHOTOELECTRON SPECTROSCOPY
Descriptors DEC
DOCUMENT TYPES; ELECTRON SPECTROSCOPY; PHOTOELECTRON SPECTROSCOPY; SPECTROSCOPY

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.