Fully patterned and low temperature transparent ZnO-based inverters
Creators
- 1. Department of Materials Science and Engineering, University of Texas at Dallas (United States)
- 2. Centro de Investigación en Materiales Avanzados, Unidad Monterrey, México (Mexico)
Description
The fabrication and characterization of transparent logic inverters based on zinc oxide (ZnO) thin film transistors (TFTs) is reported. The inverters are fabricated using standard photolithographic techniques on glass substrates, and the entire fabrication process temperature is maintained < 100 °C, which render the devices suitable for flexible and transparent electronics applications. Pulsed laser deposition is used to deposit aluminum-doped zinc oxide and ZnO as electrode and active semiconductor materials, respectively. Electrical characterization for individual TFTs demonstrate mobilities of ∼ 10 cm2/V-s, threshold voltages of 6 V, sub-threshold slopes of 630 mV/decade and ION/IOFF ratios of 5 × 106. Films characterized by UV-Vis showed optical transmission > 80% in the visible spectrum. The inverters are analyzed with AC input signals at frequencies of 100 and 500 Hz. The AC response shows an average rise and fall time transitions of 0.65 and 0.44 ms, respectively. Measured inverters delay is in the order of 0.21 ms. - Highlights: • Logic inverters based on zinc oxide thin film transistors. • Inverters fabricated using temperatures below 100 °C and standard photolithography. • Transparent aluminum-doped zinc oxide as gate, drain and source electrodes. • Devices with total transmittance in the visible range above 80%. • AC inverter response up to 500 Hz
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2013.07.069Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2013.07.069;
- PII
- S0040-6090(13)01254-6;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 545
- Journal Page Range
- p. 458-461
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46128345
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM; DOPED MATERIALS; ELECTRIC POTENTIAL; ENERGY BEAM DEPOSITION; GLASS; INVERTERS; LASER RADIATION; MOBILITY; PULSED IRRADIATION; SEMICONDUCTOR MATERIALS; SUBSTRATES; TEMPERATURE DEPENDENCE; THIN FILMS; TRANSISTORS; ZINC OXIDES
- Descriptors DEC
- CHALCOGENIDES; DEPOSITION; ELECTRICAL EQUIPMENT; ELECTROMAGNETIC RADIATION; ELEMENTS; EQUIPMENT; FILMS; IRRADIATION; MATERIALS; METALS; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; SEMICONDUCTOR DEVICES; SURFACE COATING; ZINC COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.