The corrosion behaviour and Rutherford backscattering analysis of palladium-implanted titanium
Description
The corrosion behaviour of Pd-implanted Ti in boiling 1 M H2SO4 has been investigated by means of high resolution Rutherford backscattering (RBS) profiles of the Pd concentration as a function of corrosion time, and by electrochemical methods consisting of corrosion potential vs time curves and potentiostatic polarization data. Employing ion-implanted Xe as a surface 'marker', absolute corrosion rates were determined by RBS analysis and compared to corrosion rates determined from the polarization curves. The rate of Ti dissolution is found to be reduced by about three orders of magnitude for Pd-implanted samples. The corrosion potential-time curves and high resolution RBS data both show that soon after immersion, the Pd surface concentration rises to 20 at.% because of preferential dissolution of Ti and that the Pd is retained in the surface for corrosion times of up to 9 h. The steady state corrosion potential of implanted samples is close to that of pure Pd and 800 mV anodic with respect to the corrosion potential of pure Ti. The protection is explained by the fact that the mixed electrode potential is more noble than the critical potential for passivity of Ti, resulting in a markedly reduced dissolution rate. (author)
Additional details
Publishing Information
- Journal Title
- Corros. Sci.
- Journal Volume
- 20
- Journal Issue
- 1
- Series
- Corros. Sci.
- Journal Page Range
- 103-116
- ISSN
- 0010-938X
Conference
- Title
- Ion implantation and ion beam analysis techniques in corrosion.
- Dates
- 28 - 30 Jun 1978.
- Place
- Manchester, UK.
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 11516861
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- AQUEOUS SOLUTIONS; BACKSCATTERING; CHEMICAL REACTION KINETICS; CORROSION; ELECTRIC POTENTIAL; ION IMPLANTATION; PALLADIUM IONS; POLARIZATION; RUTHERFORD SCATTERING; SPATIAL DISTRIBUTION; SULFURIC ACID; TITANIUM
- Descriptors DEC
- ATOMIC IONS; CHARGED PARTICLES; CHEMICAL REACTIONS; DISPERSIONS; DISTRIBUTION; ELASTIC SCATTERING; ELEMENTS; HOMOGENEOUS MIXTURES; HYDROGEN COMPOUNDS; INORGANIC ACIDS; IONS; KINETICS; METALS; MIXTURES; OXYGEN COMPOUNDS; REACTION KINETICS; SCATTERING; SOLUTIONS; SULFUR COMPOUNDS; TRANSITION ELEMENTS