Published February 29, 2016 | Version v1
Journal article

Study of low temperature rf-sputtered Mg-doped vanadium dioxide thermochromic films deposited on low-emissivity substrates

  • 1. Institute of Electronic Structure & Laser (IESL), Foundation for Research and Technology (FORTH) Hellas, P.O. Box 1385, Heraklion 70013, Crete (Greece)
  • 2. Physics Department, University of Crete, P.O. Box 2208, 71003 Heraklion, Crete (Greece)

Description

Undoped VO2 was fabricated by RF sputtering from metallic target on low emissivity glass substrates at a record low growth temperature. The structure of the films was examined by X-Ray Diffraction whereas temperature dependence transmittance was employed for monitoring the film's thermochromic properties. Thermochromic VO2 could be achieved at the substrate temperature of 300 °C which is the lowest growth temperature of VO2 phase by sputtering reported in literature without any additional post-deposition annealing treatment of the films. The thermochromic properties obtained for undoped VO2 were: luminous transmittance of 36.2%, metal-to-insulator transition temperature at 55.7 °C and infrared transmittance modulation, ΔTIR, (transmittance difference in the infrared, at λ = 2000 nm, when heated from 25 °C to 90 °C) by 20.5% and solar transmittance modulation ΔTsol = 5.2%. Subsequently, magnesium (Mg) was introduced in the structure of thermochromic VO2 up to 2.4 at.%, and the Mg-induced changes in thermochromisity were examined. By increasing the amount of Mg in VO2 structure the visible transmittance increased up to 70%. Improvement in thermochromic characteristics was observed for atomic percentage of Mg up to 0.3% above which the films tend to be non-thermochromic. The optimum atomic percentage of Mg (0.3 at.%) leads to thermochromic VO2 with the characteristic lowest phase transition temperature at 49.2 °C, luminous transmittance ΤIum = 46.6% and solar transmittance modulation ΔΤsol = 2.8% and ΔΤIR = 13%. Overall, 70 nm thick thermochromic VO2 films deposited at the low substrate temperature of 300 °C and low deposition rate 0.75 nm/min when doped with Mg up to 0.3 at.% resulted in vanadium dioxide with improved thermochromic properties is regarded as particularly promising for smart windows applications on flexible substrates. - Highlights: • Thermochromic VO2 was deposited by sputtering at low substrate temperature and low deposition rate. • The thermochromic properties of VO2 were studied by doping with Mg. • Temperature dependence transmittance revealed optimum Mg doping. • Mg doping increased luminous transmittance and reduced critical temperature. • Excess Mg destroyed thermochromic properties.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2015.11.007

Additional details

Identifiers

DOI
10.1016/j.tsf.2015.11.007;
PII
S0040-6090(15)01099-8;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
601
Journal Page Range
p. 99-105
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
Synthesis, processing and characterization of nanoscale multi-functional oxide films
Acronym
E-MRS spring meeting 2015 symposium N
Dates
11-15 May 2015
Place
Lille (France)

Optional Information

Copyright
Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.