Published December 15, 2009 | Version v1
Journal article

Dislocation luminescence and electrical properties of dislocation network produced by silicon direct wafer bonding

  • 1. V.A. Fok Institute of Physics, St. Petersburg State University, Ulyanovskaya 1, 108594 St. Petersburg (Russian Federation)
  • 2. SOITEC, Parc des Fontaines, F-38560 Bernin (France)

Description

Cathodoluminescent (CL) and electrical properties of the dislocation network (DN) produced by direct silicon wafer bonding were investigated. A strong impact of the electric field on the spectrum shape and the intensity of dislocation related CL of the DN built into space charge region (SCR) of Schottky-diode was found. Correlations between the characteristic features of the dependences of CL, dark current, electron beam induced current (EBIC) and capacitance on the applied bias were established. The energy diagram explaining obtained results is proposed.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.physb.2009.08.143

Additional details

Identifiers

DOI
10.1016/j.physb.2009.08.143;
PII
S0921-4526(09)00882-5;

Publishing Information

Journal Title
Physica. B, Condensed Matter
Journal Volume
404
Journal Issue
23-24
Journal Page Range
p. 4608-4611
ISSN
0921-4526
CODEN
PHYBE3

Conference

Title
25. international conference on defects in semiconductors
Dates
20-24 Jul 2009
Place
St. Petersburg (Russian Federation)

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.