Fast neutron radiation effects in siicon detectors fabricated by different thermal oxidation processes
Description
This paper reports on high resistivity silicon detectors along with MOS capacitors made on five silicon dioxides with different thermal conditions (975 degrees C to 1200 degrees C) that have been exposed to fast neutron irradiation up to the fluence of a few times 1014 n/cm2. New measurement techniques such as capacitance-voltage (C-V) of MOS capacitors and current-voltage (I-V) of back to back diodes (p+-n--p+ if n- is not inverted to;) or resistors (p+-p-+ if inverted) have been introduced in this study in monitoring the possible type-inversion (n → p) under high neutron fluence. No type-inversion in the material underneath SiO2 and the p+ contact has been observed so far in this work for detectors made on the five oxides up to the neutron fluence of a few times 1013 n/cm2. However, it has been found that detectors made on higher temperature oxides (T ≥ 1100 degrees C) exhibit less leakage current increase at high neutron fluence (φ ≥ 1013 n/cm2)
Additional details
Publishing Information
- Journal Title
- IEEE Transactions on Nuclear Science
- Journal Volume
- 39
- Journal Issue
- 4
- Journal Page Range
- p. 577-583.
- ISSN
- 0018-9499
- CODEN
- IETNAE
Conference
- Title
- 1991 Institute of Electrical and Electronic Engineers (IEEE) nuclear science symposium and medical imaging conference.
- Dates
- 2-9 Nov 1991.
- Place
- Santa Fe, NM (United States).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 24039210
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; S36: MATERIALS SCIENCE; S73: NUCLEAR PHYSICS AND RADIATION PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CAPACITORS; DAMAGING NEUTRON FLUENCE; FABRICATION; FAST NEUTRONS; INTERACTIONS; LEAKAGE CURRENT; LI-DRIFTED SI DETECTORS; MOS TRANSISTORS; P-N JUNCTIONS; PHYSICAL RADIATION EFFECTS; SEMICONDUCTOR DIODES; SILICON OXIDES; TEMPERATURE RANGE 0400-1000 K; TEMPERATURE RANGE 1000-4000 K
- Descriptors DEC
- BARYONS; CHALCOGENIDES; CURRENTS; ELECTRIC CURRENTS; ELECTRICAL EQUIPMENT; ELEMENTARY PARTICLES; ENERGY STORAGE SYSTEMS; EQUIPMENT; FERMIONS; HADRONS; LI-DRIFTED DETECTORS; MEASURING INSTRUMENTS; NEUTRON FLUENCE; NEUTRONS; NUCLEONS; OXIDES; OXYGEN COMPOUNDS; RADIATION DETECTORS; RADIATION EFFECTS; SEMICONDUCTOR DETECTORS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR JUNCTIONS; SI SEMICONDUCTOR DETECTORS; SILICON COMPOUNDS; TEMPERATURE RANGE; TRANSISTORS
Optional Information
- Secondary number(s)
- CONF-911106--.