Vertically integrated deep N-well CMOS MAPS with sparsification and time stamping capabilities for thin charged particle trackers

A fine pitch, deep N-well CMOS monolithic active pixel sensor (DNW CMOS MAPS) with sparsified readout architecture and time stamping capabilities has been designed in a vertical integration (3D) technology. In this process, two 130 nm CMOS wafers are face-to-face bonded by means of thermo-compression techniques ensuring both the mechanical stability of the structure and the electrical interconnection between circuits belonging to different layers. This 3D design represents the evolution of a DNW monolithic sensor already fabricated in a planar 130 nm CMOS technology in view of applications to the vertex detector of the International Linear Collider (ILC). The paper is devoted to discussing the main design features and expected performance of the 3D DNW MAPS. Besides describing the front-end circuits and the general architecture of the detector, the work also provides some results from calculations and Monte Carlo device simulations comparing the old 2D solution with the new 3D one and illustrating the attainable detection efficiency improvements.