Deuterium retention in carbon and tungsten-carbon mixed films deposited by magnetron sputtering in D2 atmosphere
Creators
Description
Deuterium (D) retention in carbon (C) and tungsten-carbon (W-C) mixed films deposited by reactive magnetron sputtering in D2 atmosphere has been investigated by means of secondary ion mass spectrometry and residual gas analysis measurements. In the C and W-C films, D is distributed homogeneously throughout the film thickness. With the deposition temperature increase, the D concentration in the C films is varied from ∼0.4 D/C (in units of atomic ratio) at 400 K to ∼0.02 D/C at 973 K. In its turn, the D concentration in the W-C films falls from ∼0.02 D/(W+C) at 400 K to values below 10-4 D/(W+C) at 973 K. In spite of the presence of carbon atoms in the W-C mixed films (up to 30%), the concentration of deuterium in these films is much lower than is expected from the assumption that the W-C mixed film consists of tungsten and graphite inclusions. The deuterium concentration in the W-C mixed films is close in value to that in pure tungsten or tungsten carbides. The co-deposition of carbon and tungsten atoms is speculated to lead to the formation of tungsten carbides even at temperatures as low as 400 K
Additional details
Identifiers
- PII
- S0022311502014307;
Publishing Information
- Journal Title
- Journal of Nuclear Materials
- Journal Volume
- 313-316
- Journal Issue
- 3-4
- Journal Page Range
- p. 599-603
- ISSN
- 0022-3115
- CODEN
- JNUMAM
Conference
- Title
- 15. international conference on plasma-surface interactions in controlled fusion devices
- Acronym
- PSI-15
- Dates
- 26-31 May 2002
- Place
- Gifu (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 34053077
- Subject category
- S36: MATERIALS SCIENCE; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CARBON; CONCENTRATION RATIO; DEPOSITION; DEUTERIUM; FILMS; MAGNETRONS; MASS SPECTROSCOPY; RETENTION; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0400-1000 K; TUNGSTEN; TUNGSTEN CARBIDES
- Descriptors DEC
- CARBIDES; CARBON COMPOUNDS; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; HYDROGEN ISOTOPES; ISOTOPES; LIGHT NUCLEI; METALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NONMETALS; NUCLEI; ODD-ODD NUCLEI; REFRACTORY METAL COMPOUNDS; REFRACTORY METALS; SPECTROSCOPY; STABLE ISOTOPES; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS; TUNGSTEN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.