Published March 2018 | Version v1
Journal article

Soft X-ray absorption analysis of mechanically-ground hexagonal boron nitride (h-BN) exposed to atmospheric air

  • 1. University of Hyogo, Graduate School of Engineering, Himeji, Hyogo (Japan)
  • 2. Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA (United States)

Description

To clarify the oxidation reaction of mechanically ground (MG) hexagonal boron nitride (h-BN), X-ray absorption near-edge structure (XANES) in the B K, N K, and O K regions of MG-h-BN were measured in BL-6.3.2 at the Advanced Light Source (ALS) and in BL10 at the NewSUBARU. From the XANES measurements and theoretical analysis using the discrete variational (DV) -Xα method, it can be confirmed that nitrogen atoms in hexagonal BN layers are substituted with oxygen atoms by exposure to atmospheric air after MG process. (author)

Abstract (Japanese)

機械研磨(MG)の後に大気に曝した六方晶窒化ホウ素(h-BN)の反応生成物(MG-h-BN)を軟X線吸収分光法で分析した.MG時間を変化させたMG-h-BNのB K端,N K端,O K端のX線吸収端構造(XANES)をAdvanced Light SourceのBL-6.3.2とNewSUBARUのBL10で測定した.MGによりh-BNのB-N結合が乖離して窒素が脱離し,このMG-h-BNが大気に触れると酸素が取り込まれ,最終生成物は酸化ホウ素(B2O3)になった.B K端XANESをDiscrete Variational(DV)-Xα分子軌道計算法で解析した結果,BN六角網面の窒素原子は順次酸素原子で置換されることが判明した.(著者)

Additional details

Additional titles

Original title (Japanese)
大気に暴露した機械研磨六方晶窒化ホウ素(h-BN)の軟X線吸収分析

Publishing Information

Journal Title
X-sen Bunseki No Shinpo
Journal Volume
49
Series
雑誌名:X線分析の進歩
Journal Page Range
p. 231-240
ISSN
0911-7806

Optional Information

Notes
16 refs., 11 figs.