Published September 2002 | Version v1
Journal article

Neutral gas temperatures measured within a high-density, inductively coupled plasma abatement device

  • 1. University of California-Berkeley, Berkeley, California 94720-1462 (United States)

Description

The neutral temperature within a cylindrical, inductively coupled plasma source has been studied for rare gas and molecular plasmas using the technique of optical emission thermometry. By adding small quantities of N2 to the gas feeds as an actinometer, the neutral temperature of the discharge can be estimated by simulation and fitting of the rotationally unresolved second positive band (C3Πu-B3Πg). In this work, the neutral temperature was estimated using this technique for flowing discharges of argon, helium, neon, nitrogen, and oxygen as a function of pressure and power. It was found that the neutral temperature for all of the discharges studied increased roughly proportional to the logarithm of the pressure. An increase in neutral temperature was also observed with increases in power; however, the dependence did not follow a simple functional form. The rare gases exhibited temperatures significantly above room temperature under high power (1200 W) and high pressure (∼1 Torr) conditions with argon approaching 2000 K. Molecular discharges such as N2 and O2 exhibited significantly higher temperatures (approaching 2500 K) than the rare gases even though they are expected to have lower plasma densities at the same pressure and power. It is believed that Franck-Condon heating of the gases during electron impact dissociation, vibrational excitation/thermalization, and exothermic wall reactions may all play important roles in producing such elevated temperatures. Simple, zero-dimensional plasma modeling indicates that neutral temperature elevation will result in significant increases in discharge electron temperature and electron-impact reaction rate coefficients under the same operating conditions

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Journal Volume
20
Journal Issue
5
Journal Page Range
p. 1787-1795
ISSN
0734-2101
CODEN
JVTAD6

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
35032173
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S74: ATOMIC AND MOLECULAR PHYSICS;
Resource subtype / Literary indicator
Numerical Data
Descriptors DEI
BOUNDARY LAYERS; DISSOCIATION; ELECTRON ATTACHMENT; ELECTRON TEMPERATURE; EXPERIMENTAL DATA; ION TEMPERATURE; PARTICLE SOURCES; PLASMA; PLASMA DIAGNOSTICS; PLASMA PRODUCTION; PLASMA SIMULATION; WALL EFFECTS
Descriptors DEC
DATA; INFORMATION; LAYERS; NUMERICAL DATA; RADIATION SOURCES; SIMULATION

Optional Information

Notes
(c) 2002 American Vacuum Society.