Published July 2004
| Version v1
Journal article
Plasma-assisted growth of bilayer silicon-containing coatings for hardness and corrosion resistance
Creators
- 1. Department of Electrical and Computer Engineering and Computer Science, University of Cincinnati, Cincinnati, Ohio 45221-0030 (United States)
Description
Hard corrosion-resistant bilayer coatings were grown in a high-density microwave electron cyclotron resonance discharge. The bilayer coatings consist of a relatively soft (0.6-1.5 GPa) polymer-like coating as the adherent bottom layer and a much harder (8-12 GPa) top layer. The polymer underlayers were grown from 100% octamethylcyclotetrasiloxane (OMCTS) while the hard top layer was either silicon dioxide grown from OMCTS in an oxygen plasma or silicon nitride grown from hexamethyldisiloxane in an ammonia plasma. The bilayer structures combined high surface hardness values with good corrosion resistance, surviving 1800-2600 h in an ASTM B117 salt-fog corrosion test
Additional details
Identifiers
- DOI
- 10.1116/1.1756877;
Publishing Information
- Journal Title
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
- Journal Volume
- 22
- Journal Issue
- 4
- Journal Page Range
- p. 1124-1128
- ISSN
- 0734-2101
- CODEN
- JVTAD6
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36028013
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- AMMONIA; CORROSION RESISTANCE; ELECTRON CYCLOTRON-RESONANCE; HARDNESS; OXYGEN; PLASMA; POLYMERS; PRESSURE RANGE GIGA PA; PROTECTIVE COATINGS; SILICON; SILICON NITRIDES; SILICON OXIDES; SILOXANES
- Descriptors DEC
- CHALCOGENIDES; COATINGS; CYCLOTRON RESONANCE; ELEMENTS; HYDRIDES; HYDROGEN COMPOUNDS; MECHANICAL PROPERTIES; NITRIDES; NITROGEN COMPOUNDS; NITROGEN HYDRIDES; NONMETALS; ORGANIC COMPOUNDS; ORGANIC SILICON COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PNICTIDES; PRESSURE RANGE; RESONANCE; SEMIMETALS; SILICON COMPOUNDS
Optional Information
- Notes
- (c) 2004 American Vacuum Society.