Published June 2021 | Version v1
Journal article

The effect of nickel doped Bismuth Vanadium Oxide on microstructures and electric properties towards BiVO4-NiO composite

  • 1. Doctoral Student of Mechanical Engineering, Brawijaya University, Malang (Indonesia)
  • 2. State Polytechnics of Malang (Indonesia)
  • 3. Department of Mechanical Engineering, Brawijaya University, Malang (Indonesia)

Description

Highlights: • Reduce the peak intensity with Ni added to BiVO4. • The BiVO4 granules fill large pores with NiO grains. • The vibrations of bending in ~530 cm−1 were verified for the group of VO43 • Enhancement of current could be the improvement of oxygen kinetics properties. • The addition of Ni increased the electrical properties of BiVO4. The preparation of BiVO4-NiO of microstructures and electric properties has been done using water solution and coated with indium tin oxide (ITO). BiVO4-NiO material was prepared using BiVO4, NiO powders and ITO. Mixing and coating processes were held using water and the resulting paste was coated by screen printing using a small glass stick on an ITO. The heat temperature process was done at 260 °C for 2 h. Samples were characterized using XRD, SEM-EDS and FTIR. The effect of ion Nickel addition did not change the monoclinic structure of bismuth vanadium. The Ni ions have been substituted Bi ion in the bismuth vanadium system which is indicated by the change of lattice parameters and compositions. Then, the additions decrease peak intensity increases due to the bigger microstructures observed. The addition Ni does not affect BiVO4 but decreased the peak band BiVO4 as increases Ni. The linear voltammograms observed an increase BiVO4 with increases Ni because the enhancement of current could improve the oxygen kinetics properties and surface passivation of the electrode in BiVO4-NiO. Therefore, the addition of NiO is reflected in an increase in electrical conductivity.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.matchemphys.2021.124452

Additional details

Identifiers

DOI
10.1016/j.matchemphys.2021.124452;
PII
S0254058421002352;

Publishing Information

Journal Title
Materials Chemistry and Physics (Print)
Journal Volume
265
Journal Page Range
vp.
ISSN
0254-0584
CODEN
MCHPDR

Optional Information

Copyright
Copyright (c) 2021 The Author(s). Published by Elsevier B.V.