Published July 15, 2014 | Version v1
Journal article

Characterization of hydrogenated and deuterated thin carbon films deposited by magnetron sputtering

  • 1. Horia Hulubei National Institute for Physics and Nuclear Engineering (IFIN-HH), P.O.B. MG-6, 30 Reactorului St., RO 077125 Magurele (Romania)
  • 2. University Politehnica of Bucharest, RO 060042 Bucharest (Romania)
  • 3. National Institute for Materials Physics, 105 Atomistilor Str., RO 077125 Magurele-Bucharest (Romania)
  • 4. National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Str., RO 077125 Magurele-Bucharest (Romania)

Description

Thin films of C layers were deposited by radiofrequency magnetron sputtering on silicon substrates using three gaseous atmospheres: pure Ar, Ar + H2 and Ar + D2 mixtures. Scanning Electron Microscopy investigations showed that addition of D2 or H2 to main sputtering gas (Ar) leads to the enhancement of the deposition rate while the layer morphology remained columnar. Fourier Transform Infrared Spectroscopy measurements revealed the presence of D–C or H–C chemical bonds in the samples. Ion beam analysis measurements performed by simultaneous recording of the recoiled H and D ions, and of backscattered 4He confirmed the incorporation of hydrogen and deuterium in the deposited carbon thin films

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nimb.2014.01.029

Additional details

Identifiers

DOI
10.1016/j.nimb.2014.01.029;
PII
S0168-583X(14)00265-1;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
331
Journal Page Range
p. 121-124
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
11. European conference on accelerators in applied research and technology
Dates
8-13 Sep 2013
Place
Namur (Belgium)

Optional Information

Copyright
Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.